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dc.contributor.advisorEstévez De Vidts, L. Antonio
dc.contributor.authorVyhmeister Bastidas, Eduardo Andrés
dc.date.accessioned2018-04-09T15:52:21Z
dc.date.available2018-04-09T15:52:21Z
dc.date.submitted2008
dc.identifier.urihttp://hdl.handle.net/20.500.11801/463
dc.description.sponsorshipNSF/SRC EBSM Engineering Research Centeren_US
dc.language.isoenen_US
dc.subjectMethylsilsesquioxane filmsen_US
dc.subjectNanoporous filmsen_US
dc.subject.lcshSilylationen_US
dc.subject.lcshSupercritical fluidsen_US
dc.subject.lcshIntegrated circuitsen_US
dc.subject.lcshChlorosilanes--Solubilityen_US
dc.titleSurface modification of nanoporous films using organosilanes dissolved in supercritical carbon dioxideen_US
dc.rights.licenseAll rights reserveden_US
dc.rights.holder(c) 2008 Eduardo Andrés Vyhmeister Bastidasen_US
dc.contributor.committeeBenítez Rodríguez, Jaime
dc.contributor.committeeColón Burgos, Guillermo
dc.contributor.committeeMuscat, Anthony J.
dc.contributor.representativeRivera Montalvo, Luis A.
dc.degree.levelPh.D.en_US
dc.degree.disciplineChemical Engineeringen_US
dc.thesis.typeDissertationen_US
dc.local.collegeCollege of Engineeringen_US
dc.local.departmentDepartment of Chemical Engineeringen_US
dc.graduation.year2008en_US


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